国家/地区 中国（7）
IPC部 C（7）
IPC大类 C01（7） C09（7） H05（6）
B82（2）
IPC小类 C01B（7）
IPC C09K003/00（7）
发明人
公开年 2021（5） 2022（2）
申请年 2021（7）
专利权人

Preparing high frequency soft magnetic ferric oxide/tin dioxide/graphene composite wave absorbing material for communication device, involves preparing oxidation graphene dispersion ultrasonically dispersing concentration prepared by hummer's method graphene then adding distilled water.

WANG J, CUI D

Preparation of cobalt-iron-carbon/reduced graphene oxide electromagnetic wave absorption composite material by dissolving graphene oxide in deionized water, adding citrate and cobalt salt, dissolving, and pouring ferricyanide solution.

GAO H, SHI Z, WEI S, CHEN S

Preparing composite thin film electromagnetic protective material based on MXene-reduced graphene oxide comprises taking titanium carbide colloidal solution, mixing, reacting with graphene oxide suspension and colloidal solution, filtering to form film, placing in quartz glass sheet and annealing.

WANG Q, SUN X, WANG L, ZHOU X, ZHAO M, WAN H, QU Z, CHENG E, WANG P

Preparing silicon carbide composite material, comprises mixing silicon source, ethanol and water, placing whole crucible in vacuum tube high-temperature furnace for reaction, storing, and freeze-drying solid material removed from solution.

FENG K, ZHAO T, ZHOU Z, SHI D

Graphene composite material useful in thermally conductive and/or electrical shielding materials, comprises carbon-coated hollow silicon dioxide connected with laminated structure of layered reduced graphene oxide.

PANG H, YU Y, ZHAO Y, LIAO B, ZHANG X

Carbon nanotube base film material prepared at atmospheric pressure comprises carbon nanotube in the surface of carbon nanotube base film material arranged with orientation.

WU N, ZENG Z

Preparation of boron carbonitride nanosheet used as supercapacitor electrode material for, e.g. catalytic adsorption material by weighing and mixing carbon source, boron source and nitrogen source, drying, grinding, degassing, and heating.

YU W, XIN B, LUO J, SHEN D, KONG F, YU M, LIU Y, YUAN X, FAN M, ZHU R