国家/地区 中国（2）
IPC部 C（2）
IPC大类 C23（2）
IPC小类 C23C（2）
IPC C23C016/26（2）
发明人
公开年
申请年 2022（2）
专利权人

Box type negative-pressure roll-to-roll preparation device, has protective gas and carbon source supply mechanism connected with box body to introduce carbon source and protective gas into box body.

WU Q, SONG S, MA Y

Heating furnace for use in chemical vapor deposition reaction device, has graphite plate supporting wafer substrate, where one side surface used for substrate is provided with growth graphene.

XUE Z, CHEN Z, SHAN J, WANG M, SUN J, LIU Z