国家/地区 中国（2）
IPC部 C（2）
IPC大类 C30（2）
IPC小类 C30B（2）
IPC C30B033/02（2）
发明人
公开年
申请年
专利权人 UNIV PEKING（2）

Preparing a metal wafer substrate involves forming metal thin film on the sapphire substrate by magnetron sputtering, and annealing under mixed atmosphere of hydrogen and argon.

PENG H, YANG Y, CAO Y, TANG J, YAN R, DU Y

Preparation of continuous large single crystal graphene by mixing raw materials, and subjecting to rotating device for continuous growth of graphene on surface of substrate.

LIU K, YU D, WANG E, ZHANG Z, XU X