国家/地区 日本（4）
IPC部 B（4）
IPC大类 C01（4） C09（2） H05（2）
IPC小类 C01B（4）
IPC C01B032/19（4）
发明人 KOBAYASHI H（2）
公开年 2022（4）
申请年 2020（3） 
专利权人 KOBAYASHI H（2）

Graphene material used in substrate for sustained release of non-aqueous component, having specific total porosity and open porosity.

MURAMATSU K, TAKAHASHI K, IWATA H, SUTANI K, YABUMOTO H, IWATA E

Producing graphene by forming buffer layer made of silicon oxycarbide and single layer of graphene formed on buffer layer on surface of silicon carbide substrate by heating silicon carbide substrate in atmosphere of acetylene gas and oxygen gas, and peeling single layer of graphene.

TANIYASU Y, SASAKI K, TANAKA S, KAJIWARA T

Collection of graphene aggregates used in manufacture of paste, involves classifying graphene into collection of graphene covered with n-butanol of multiple sizes, filling parallel plate electrode with n-butanol, producing graphene aggregate, and classifying into collection of covered graphene.

KOBAYASHI H

Production of paste for forming film, involves flatly packing aggregates of scaly graphite particles/massive graphite particles on parallel plate electrodes, immersing in methanol diluted solution of organic compound in container, and applying electric field and vibration acceleration to container.

KOBAYASHI H