国家/地区 日本（3）
IPC部 B（3）
IPC大类 C09（3）
IPC小类 C09K（3） B82Y（2） C01B（2）
C08K（2） F16D（2）
IPC C09K003/14（3）
发明人
公开年
申请年
专利权人

Carbon abrasive used to polish slurry, and manufacture semiconductor device contains carbon nanoparticle, and positively charged polymer, and/or positively charged oligomer disposed on surface of carbon nanoparticle.

TAKAI K, KIM D Y, KIM D

Synthesizing graphene comprises refluxing reaction mixture of solvent e.g. water and carbonaceous material promoting polycyclic aromatic hydrocarbon formation, collecting and directing obtained vapors to substrate and recovering graphene.

SHANKMAN R S, HANKMAN R S

Graphene oxide sheet used for graphene-containing material, is obtained by dispersing graphene-containing carbon substance using dispersing agent to reduce size of aggregation unit of carbon substance, and oxidizing resulting product.

FUGETSU B