国家/地区 中国（4） 美国（3）
IPC部 C（7）
IPC大类 C01（7） B01（4） C09（2）
IPC小类 C01B（7）
IPC C01B032/19（4） B01J019/18（2） B01J020/30（2）
C01B032/194（2） C01B032/198（2） C01B032/22（2）
C01B032/225（2） C09D001/00（2） C09D007/20（2）
发明人 WU T（7）
公开年 2021（5）
申请年 2021（7）
专利权人 TAIWAN TEXTI.（2）

Preparation of graphene aerogel for carbon dioxide adsorption, involves preparing graphene-polyethyleneimine-chitosan composite slurry, and freezing in mold where thermal conductivity coefficient of bottom is greater than that of side wall.

CHENG A, HE Z, GAO S, LIU L, LI X, WANG Q, WU T

Preparing patterned graphene, comprises forming accommodating passage in silicon carbide base, providing catalyst and insulating substrate, placing catalyst in accommodating passage, and placing sandwich structure in heating device.

GAO B, ZHANG C, GU J, WU T, ZHU H

Preparing graphene dispersion used as coating field, and important additive in products such as conductive coatings and auxiliaries, involves performing homogenization on graphene powder, and using processing solvent to form graphene paste.

LIN B, LI H, CHANG T, WU T

Graphene dispersion, formed by graphene powder and processing solvent comprising e.g. hydrocarbon solvent, halogenated hydrocarbon solvent, alcohol solvent, phenol solvent, ketone solvent, ester solvent, ether solvent, acetal solvent, acid solvent and acid anhydride solvent.

LIN B, LI H, CHANG T, WU T

Preparing nitrogen-doped reduced graphene oxide nano-composite for treatment of phenolic wastewater, involves mixing chitosan, glacial acetic acid and water to obtain chitosan acetic acid aqueous solution, and mixing graphene oxide.

LI Y, WANG Q, ZHAO R, LI Z, WU T

Graphene modified polyethylene terephthalate film material, comprises graphite, ethylene glycol as raw materials, and modified graphene prepared by ball milling in supercritical carbon dioxide atmosphere.

WU D, CHEN D, WU T

Preparing graphene powder by aqueous phase-enhanced exfoliation method, involves opening interlayer of flake graphite under action of concentrated sulfuric acid, and oxidant.

XING F, WU T, LI Z, HAN X, JI G, TIAN J