国家/地区
IPC部 B（2）
IPC大类 B01（2） C23（2）
IPC小类 B01J（2）
IPC C23C016/455（2）
发明人
公开年 2023（2）
申请年 2022（2） 
专利权人

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Preparing confinement structure composite material comprises forming nanoporous material layer of first material and second material filled in nanopore, so that nanopores form hydrophilic or hydrophobic confinement space.

XU W, ZHANG Q, CHEN B, XIAO X