国家/地区 日本（3） 美国（3） 中国（2） 欧洲专利局（EPO）（2） 世界知识产权组织（2）
IPC部 B（4）
IPC大类 B05（4）
IPC小类 B05D（4）
IPC B05D001/28（4）
发明人
公开年 2015（4）
申请年 2013（2） 
专利权人

Method for forming workpiece of e.g. electronic device, involves removing layer of material on top of graphene surface in predetermined pattern, and releasing graphene from catalytic film such that graphene is in form of patterned layer.

JOHNSON A T, GUDIBANDE R R, QI Z J, JOHNSON A, GUDIBANDE R, QI Z

Etching method of graphene, involves etching exposed portions of graphene to form etched graphene structure, after applying resist to surface of graphene opposite to patterned substrate.

ANDERSON K, SJONG A

Coated article comprises a low temperature component and a graphene coating formed from applying the graphene derivative over the low temperature component.

KALAGA M K, BHATTACHARYYA A, DEVI R M, SCHAEFFER J C, PARAKALA P, PABLA S S, SHEFFIELD J C, PALAKARA P, PABRA S S, CARAGA M K, DEVIE R M

Method for film-forming carbonaceous material e.g. graphene used for manufacturing electroconductive film used as negative electrode of lithium cell, involves mixing water content and carbon-type fine powder to form kneading dough.

MACHIDA S