国家/地区 美国（2）
IPC部 C（2） H（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B031/04（2） H01B001/04（2）
发明人 LEE S H（2）
公开年
申请年
专利权人 KOREA INST SCI TECHNOLOGY（2）

Polymer nanomesh used for preparation of graphene nanomesh, has planar structure having cyclized nanomesh-forming polymer and two-dimensional holes arranged on planar structure.

JOH H, SON S Y, LEE S H, KIM T

Manufacture of reduced graphene oxide for manufacturing reduced graphene-polymer composite, involves treating graphite with strong acid, mixing with halogen-substituted aromatic compound and stirring.

KU B C, PARK O K, LEE S H, NA S I, JO H I, KIM J K, LEE J H, KU B, PARK O