国家/地区 中国（2）
IPC部 A（2）
IPC大类 A41（2） B32（2）
IPC小类 A41D（2）
IPC A41D031/30（2）
发明人
公开年 2021（2）
申请年 2020（2） 
专利权人

Preparing graphene-based photosensitive antibacterial medical protective clothing fabric comprises preparing fabric includes preparing base fabric, blending cotton fibers and metal fibers to prepare base fabric.

SHU Y

Graphene antibacterial mask, has first connecting belt whose side part is fixed on first movable sleeve, and second connecting belt whose side part is fixed with first magic patch, where middle part of second connecting belt is fixed with second patch.

WANG Q, LIU S