国家/地区 中国（2）
IPC部 C（2）
IPC大类 C25（2）
IPC小类 C25D（2）
IPC C25D005/54（2）
发明人
公开年 2013（2）
申请年
专利权人

Flexible substrate processing apparatus used for reducing graphene oxide to form graphene comprises substrate carrying-out portion; reduction treatment portion; washing portion; drying portion; and substrate carrying-in portion.

TAKAHASHI M, SAITO Y, MOMO J, MORIWAKA T, KUSUMOTO N, MORIWAKA K, YONEDA Y

Direct-electroplating conductive liquid is prepared by adding specified amount of graphene and stabilizer comprises polyacrylic acid, carboxymethylcellulose and/or sodium silicate into deionized water.

XUE Q