国家/地区 中国（7）
IPC部 C（7）
IPC大类 C09（7）
IPC小类 C09D（7）
IPC C09D127/12（7）
发明人 WU Y（7）
公开年 2023（2）
申请年 2016（2）  2022（2） 
专利权人 STATE GRID C.（2） STATE GRID S.（2）

Moisture barrier paint used for moisture resistance protection of rigid closed cell polyurethane foam, comprises adhesive, active micro-nano material, sheet-like inorganic material, fluororesin, polypropylene, xylene, propylene glycol methyl ether acetate and additives.

ZHOU C, MA Z, XIANG Y, WU Y, YU B, XU Y, ZHOU F

Anti-corrosion and weather-resistant powder coating for battery pack shell, includes transition layer powder containing methylimidazole, main functional layer powder containing porous nanomaterial loaded with anti-corrosion component, and protective layer powder containing nano-graphene.

WANG S, XU T, WU Y

Antistatic powder coating comprises resin, curing agent, flatting agent, coupling agent, antifoaming agent, electric power increasing agent, other auxiliary agent, pigments and fillers, and dispersant.

WEI Y, HUANG Z, WU Y, ZHU X

Super weather-resistant cover light powder coating includes fluorocarbon resin, polyacrylic resin, polycarboxylic acid, polyanhydride, isocyanate curing agent, leveling agent, accelerator, modified graphene auxiliary agent and filler.

WEI Y, HUANG Z, WU Y, NAN R, CAI J

Graphene-modified hydrazide curing agent comprises graphene, mixed solution of polyacrylic acid emulsion and water, and hydrazide.

WANG X, LI X, SU J, JIANG B, WU Y, MI C, LI W, ZONG L, ZHAO M, FAN Z, YAN F, GUO K, ZHANG Z, WANG D

Graphite-phase carbon nitride-graphene composite modified heat-conducting self-cleaning fluorocarbon finishing coat used for e.g. aerospace equipment includes fluorocarbon resin and graphitic carbon nitride/reduced graphene oxide.

LI W, WANG G, FENG C, FAN Z, YUE Z, LI X, ZHANG Z, WANG X, YAN F, GUO K, WU Y, ZHAI J, LIU Y

Graphene-doped radiation-proof coating comprises base resin, graphene, octa(aminophenyl) polysilsesquioxane, ferric oxide nano particles, aluminum oxide nano powder, calcium carbonate, defoamer, dispersant and solvent.

CHEN G, DAI L, LUO W, MAO J, XU Y, YUAN C, ZENG B, WU T, LI Y, WU Y