国家/地区 欧洲专利局（EPO）（3）
IPC部 C（3） H（3）
IPC大类 C01（3） H01（3）
IPC小类 C01B（3）
IPC C01B032/186（3）
发明人 FOURNEL F（2） FUGIER P（2） GOLANSKI L（2）
RODRIGUEZ G（2）
公开年 2018（3）
申请年 2017（3） 
专利权人 COMMISSARIAT.（3）

Substrate used to produce graphene film, comprises stack of self-supporting base, electrically insulating layer and catalyst layer with self-supporting base having basic monocrystalline area, in succession and superimposed on each other.

GOLANSKI L, FOURNEL F, FUGIER P, RODRIGUEZ G

Producing graphene film used in e.g. biological sensors involves forming graphene film by epitaxial deposition in contact with platinum-containing monocrystalline zone of substrate catalyst layer using chemical vapor deposition device.

GOLANSKI L, FOURNEL F, FUGIER P, RODRIGUEZ G

Process for preparing graphene layer with better electrical conductivity, involves doping zone of graphene layer to form doped graphene zone including stabilized sheet resistance, where doping is carried out by surface of graphene layer.

LE POCHE H, CARELLA A, DIJON J, OKUNO H, RAUX E