国家/地区 印度（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC
发明人 KUMAR B（2）
公开年 2021（2）
申请年
专利权人 UNIV AMITY（2）

Nano-patterning graphene used in respiratory masks, by cleaning monolayer of graphene sheet, transferring graphene on silicon dioxide/silicon substrate, depositing metal film of silver or gold on substrate, annealing silver or gold nanoparticles and performing aqua-regia treatment.

KUMAR B

System and realizing band gap opening in graphene, used to induce band gap in bilayer graphene, involves e.g. cleaning monolayer of graphene sheet on copper foil and cutting, stacking two graphene sheets together, and rolling stacked sheets.

KUMAR B