国家/地区 France（10）
关键词 GRAPHENE（2） MOLECULAR DYNAMIC（2） PHOTOELECTRON SPECT.（2）
PHOTOEMISSION ELECT.（2）
出版物 JOURNAL OF APPLIED .（5）
出版时间 2016（3） 2015（2） 2018（2） 2019（2）
机构 UNIV GRENOBL.（7）
作者 CUNGE G（11）

Engineering Self-Assembly of a High-chi Block Copolymer for Large-Area Fabrication of Transistors Based on Functional Graphene Nanoribbon Arrays

CHEMISTRY OF MATERIALS

ARIASZAPATA J, GARNIER JD, HASANAL MEHEDI, LEGRAIN A, SALEM B, CUNGE G, ZELSMANN M

CF4/H-2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material

ACS APPLIED NANO MATERIALS

FERRAH D, RENAULT O, MARINOV D, ARIASZAPATA J, CHEVALIER N, MARIOLLE D, ROUCHON D, OKUNO H, BOUCHIAT V, CUNGE G

High density H-2 and He plasmas: Can they be used to treat graphene?

JOURNAL OF APPLIED PHYSICS

MEHEDI HA, FERRAH D, DUBOIS J, PETITETIENNE C, OKUNO H, BOUCHIAT V, RENAULT O, CUNGE G

Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

ARIASZAPATA J, FERRAH D, MEHEDI HA, CUNGE G, ZELSMANN M

Elementary processes of H-2 plasma-graphene interaction: A combined molecular dynamics and density functional theory study

JOURNAL OF APPLIED PHYSICS

DESPIAUPUJO E, DAVYDOVA A, CUNGE G, DELFOUR L, MAGAUD L, GRAVES DB

H+ ion-induced damage and etching of multilayer graphene in H-2 plasmas

JOURNAL OF APPLIED PHYSICS

DAVYDOVA A, DESPIAUPUJO E, CUNGE G, GRAVES DB

XPS investigations of graphene surface cleaning using H-2- and Cl-2-based inductively coupled plasma

SURFACE INTERFACE ANALYSIS

FERRAH D, RENAULT O, PETITETIENNE C, OKUNO H, BERNE C, BOUCHIAT V, CUNGE G

Cleaning graphene: A first quantum/classical molecular dynamics approach

JOURNAL OF APPLIED PHYSICS

DELFOUR L, DAVYDOVA A, DESPIAUPUJO E, CUNGE G, GRAVES DB, MAGAUD L

Hydrogen Plasmas Processing of Graphene Surfaces

PLASMA CHEMISTRY PLASMA PROCESSING

DESPIAUPUJO E, DAVYDOVA A, CUNGE G, GRAVES DB

Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H-2 and H-2-N-2 plasmas

JOURNAL OF APPLIED PHYSICS

CUNGE G, FERRAH D, PETITETIENNE C, DAVYDOVA A, OKUNO H, KALITA D, BOUCHIAT V, RENAULT O