AIP ADVANCES

PATEL D, MARZANO M, LIU CI, HILL HM, KRUSKOPF M, JIN H, HU JN, NEWELL DB, LIANG CT, ELMQUIST R, RIGOSI AF

ACS APPLIED ELECTRONIC MATERIALS

WU BY, YANG YF, RIGOSI AF, HU JN, LEE HY, CHENG GJ, PANCHAL V, KRUSKOPF M, JIN H, WATANABE K, TANIGUCHI T, NEWELL DB, ELMQUIST RE, LIANG CT

CARBON

RIGOSI AE, PATEL D, MARZANO M, KRUSKOPF M, HILL HM, JIN H, HU JN, WALKER ARH, ORTOLANO M, CALLEGARO L, LIANG CT, NEWELL DB

IEEE TRANSACTIONS ON INSTRUMENTATION MEASUREMENT

RIGOSI AF, PANNA AR, PAYAGALA SU, KRUSKOPF M, KRAFT ME, JONES GR, WU BY, LEE HY, YANG YF, HU JN, JARRETT DG, NEWELL DB, ELMQUIST RE

SCIENTIFIC REPORTS

HU JN, RIGOSI AF, KRUSKOPF M, YANG YF, WU BY, TIAN JF, PANNA AR, LEE HY, PAYAGALA SU, JONES GR, KRAFT ME, JARRETT DG, WATANABE K, TANIGUCHI T, ELMQUIST RE, NEWELL DB

PHYSICAL REVIEW B

HU JN, RIGOSI AF, LEE JU, LEE HY, YANG YF, LIU CI, ELMQUIST RE, NEWELL DB

MICROELECTRONIC ENGINEERING

RIGOSI AF, LIU CI, WU BY, LEE HY, KRUSKOPF M, YANG YF, HILL HM, HU JN, BITTLE EG, OBRZUT J, WALKER ARH, ELMQUIST RE, NEWELL DB

2D MATERIALS

RIGOSI AF, HILL HM, GLAVIN NR, POOKPANRATANA SJ, YANG YF, BOOSALIS AG, HU JN, RICE A, ALLERMAN AA, NGUYEN NV, HACKER CA, ELMQUIST RE, WALKER ARH, NEWELL DB

APPLIED PHYSICS LETTERS

PARK W, HU JN, JAUREGUI LA, RUAN XL, CHEN YP

JOURNAL OF APPLIED PHYSICS

VALLABHANENI AK, QIU B, HU JN, CHEN YP, ROY AK, RUAN XL