国家/地区 | Usa(17) |
关键词 | EPITAXIAL GRAPHENE(2) |
出版物 | APPLIED PHYSICS LET.(3) PHYSICAL REVIEW B(2) |
出版时间 | 2018(4) 2012(2) 2017(2) 2019(2) |
机构 | NIST(9) PURDUE UNIV(7) |
作者 | HU JN(17) |
AIP ADVANCES
PATEL D, MARZANO M, LIU CI, HILL HM, KRUSKOPF M, JIN H, HU JN, NEWELL DB, LIANG CT, ELMQUIST R, RIGOSI AF
CARBON
RIGOSI AE, PATEL D, MARZANO M, KRUSKOPF M, HILL HM, JIN H, HU JN, WALKER ARH, ORTOLANO M, CALLEGARO L, LIANG CT, NEWELL DB
IEEE TRANSACTIONS ON INSTRUMENTATION MEASUREMENT
RIGOSI AF, PANNA AR, PAYAGALA SU, KRUSKOPF M, KRAFT ME, JONES GR, WU BY, LEE HY, YANG YF, HU JN, JARRETT DG, NEWELL DB, ELMQUIST RE
SCIENTIFIC REPORTS
HU JN, RIGOSI AF, KRUSKOPF M, YANG YF, WU BY, TIAN JF, PANNA AR, LEE HY, PAYAGALA SU, JONES GR, KRAFT ME, JARRETT DG, WATANABE K, TANIGUCHI T, ELMQUIST RE, NEWELL DB
PHYSICAL REVIEW B
HU JN, RIGOSI AF, LEE JU, LEE HY, YANG YF, LIU CI, ELMQUIST RE, NEWELL DB
MICROELECTRONIC ENGINEERING
RIGOSI AF, LIU CI, WU BY, LEE HY, KRUSKOPF M, YANG YF, HILL HM, HU JN, BITTLE EG, OBRZUT J, WALKER ARH, ELMQUIST RE, NEWELL DB
2D MATERIALS
RIGOSI AF, HILL HM, GLAVIN NR, POOKPANRATANA SJ, YANG YF, BOOSALIS AG, HU JN, RICE A, ALLERMAN AA, NGUYEN NV, HACKER CA, ELMQUIST RE, WALKER ARH, NEWELL DB
APPLIED PHYSICS LETTERS
PARK W, HU JN, JAUREGUI LA, RUAN XL, CHEN YP
JOURNAL OF APPLIED PHYSICS
VALLABHANENI AK, QIU B, HU JN, CHEN YP, ROY AK, RUAN XL
PHYSICAL REVIEW B
GUNAWARDANA KGSH, MULLEN K, HU JN, CHEN YP, RUAN XL