国家/地区 Usa(16) Germany(8) Italy(2) Republic(2)
关键词 GRAPHENE(9) EPITAXIAL GRAPHENE(8) QUANTUM HALL EFFECT(7)
QUANTIZED HALL RESI.(3) BUFFER LAYER(2) EPITAXIAL GRAPHENE .(2)
JOSEPHSON ARBITRARY.(2) MAGNETOTRANSPORT(2) QUANTUM HALL RESIST.(2)
RESISTANCE ANISOTRO.(2) STANDARD RESISTOR(2)
出版物 IEEE TRANSACTIONS O.(4) PHYSICAL REVIEW B(4) CARBON(3)
METROLOGIA(3) ACS APPLIED ELECTRO.(2) AIP ADVANCES(2)
MEASUREMENT SCIENCE.(2)
出版时间 2020(8) 2021(6) 2018(5) 2019(3) 2022(3) 2016(2) 2017(2)
机构 NIST(12) PHYS TECH BU.(6)
作者 KRUSKOPF M(30)

IEEE TRANSACTIONS ON INSTRUMENTATION MEASUREMENT

PAYAGALA SU, RIGOSI AF, PANNA AR, POLLAROLO A, KRUSKOPF M, SCHLAMMINGER S, JARRETT DG, BROWN R, ELMQUIST RE, BROWN D, NEWELL DB

JOURNAL OF PHYSICS DAPPLIED PHYSICS

LIU CI, SCALETTA DS, PATEL DK, KRUSKOPF M, LEVY A, HILL HM, RIGOSI AF

IEEE TRANSACTIONS ON INSTRUMENTATION MEASUREMENT

OE T, RIGOSI AF, KRUSKOPF M, WU BY, LEE HY, YANG YF, ELMQUIST RE, KANEKO NH, JARRETT DG

PHYSICA BCONDENSED MATTER

RIGOSI AF, MARZANO M, LEVY A, HILL HM, PATEL DK, KRUSKOPF M, JIN H, ELMQUIST RE, NEWELL DB

AIP ADVANCES

LIU CI, PATEL DK, MARZANO M, KRUSKOPF M, HILL HM, RIGOSI AF

METROLOGIA

MARZANO M, KRUSKOPF M, PANNA AR, RIGOSI AF, PATEL DK, JIN HY, CULAR S, CALLEGARO L, ELMQUIST RE, ORTOLANO M

AIP ADVANCES

PATEL D, MARZANO M, LIU CI, HILL HM, KRUSKOPF M, JIN H, HU JN, NEWELL DB, LIANG CT, ELMQUIST R, RIGOSI AF

ACS APPLIED ELECTRONIC MATERIALS

WU BY, YANG YF, RIGOSI AF, HU JN, LEE HY, CHENG GJ, PANCHAL V, KRUSKOPF M, JIN H, WATANABE K, TANIGUCHI T, NEWELL DB, ELMQUIST RE, LIANG CT

CARBON

RIGOSI AE, PATEL D, MARZANO M, KRUSKOPF M, HILL HM, JIN H, HU JN, WALKER ARH, ORTOLANO M, CALLEGARO L, LIANG CT, NEWELL DB

IEEE TRANSACTIONS ON INSTRUMENTATION MEASUREMENT

RIGOSI AF, PANNA AR, PAYAGALA SU, KRUSKOPF M, KRAFT ME, JONES GR, WU BY, LEE HY, YANG YF, HU JN, JARRETT DG, NEWELL DB, ELMQUIST RE