国家/地区 China（2）
关键词 ATOMIC LAYER DEPOSITION（6）
出版物
出版时间 2022（6）
机构
作者

ALD-Assisted Graphene Functionalization for Advanced Applications

JOURNAL OF ELECTRONIC MATERIALS

ZHOU YB, WANG JT, HE P, CHEN SM, CHEN Z, ZANG YQ, LI Y, DUAN Y

Area-Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation

ADVANCED MATERIALS INTERFACES

MENTEL KK, EMELIANOV AV, PHILIP A, JOHANSSON A, KARPPINEN M, PETTERSSON M

Rationally tailoring interface characteristics of ZnO/amorphous carbon/graphene for heat-conduction microwave absorbers

NANO RESEARCH

ZHOU MF, XU XF, WAN GP, MOU PP, TENG SJ, WANG GZ

Shielding Effectiveness of Ideal Monolayer Graphene in Cylindrical Configurations With the Method of Auxiliary Sources

IEEE TRANSACTIONS ON ELECTROMAGNETIC COMPATIBILITY

KOUROUBLAKIS M, TSITSAS NL, FIKIORIS G

Contamination-induced inhomogeneity of noise sources distribution in Al2O3-passivated quasi-free-standing graphene on 4H-SiC(0001)

PHYSICA ELOWDIMENSIONAL SYSTEMS NANOSTRUCTURES

CIUK T, CIURA L, MICHALOWSKI PP, JAGIELLO J, DOBROWOLSKI A, PIETAK K, KALITA D, WZOREK M, BUDZICH R, CZOLAK D, KOLEK A

The role of oxygen defects engineering via passivation of the Al2O3 interfacial layer for the direct growth of a graphene-silicon Schottky junction solar cell

APPLIED MATERIALS TODAY

KIM M, REHMAN MA, KANG KM, WANG Y, PARK S, LEE HS, ROY SB, CHUN SH, SINGH CA, JUN SC, PARK HH