国家/地区 China(2) Korea(2) Usa(2)
关键词 PHOTORESIST(6)
出版物 ACS NANO(2)
出版时间 2014(2) 2021(2)
机构
作者

MATERIALS RESEARCH EXPRESS

CAI AJ, YU W, ZHANG GD, ZHAO YL, SUN J, LIU Y, ZHANG DP

MATERIALS LETTERS

ILANCHEZHIYAN P, EO JJ, ZAKIROV AS, RAM SDG, PANIN GN, KANG TW

MICRO NANO LETTERS

WANG DZ, MA Q, LIANG JS, XUE FH, CHEN L, WANG XD, ZHOU XF, LIU ZP

ACS NANO

BECKHAM JL, LI JT, STANFORD MG, CHEN WY, MCHUGH EA, ADVINCULA PA, WYSS KM, CHYAN YE, BOLDMAN WL, RACK PD, TOUR JM

ACS NANO

PAGADUAN JN, HIGHTHUF N, DATAR A, NAGAR Y, BARNES M, NAVEH D, RAMASUBRAMANIAM A, KATSUMATA R, EMRICK T