国家/地区 England（7）
关键词
出版物 APPLIED PHYSICS LET.（3） RSC ADVANCES（2）
出版时间 2016（3） 2017（2）
机构 UNIV CAMBRIDGE（7）
作者 D ARSIE L（7）

Stability of graphene doping with MoO3 and I-2

APPLIED PHYSICS LETTERS

D ARSIE L, ESCONJAUREGUI S, WEATHERUP R, GUO YZ, BHARDWAJ S, CENTENO A, ZURUTUZA A, CEPEK C, ROBERTSON J

Adsorptive graphene doping: Effect of a polymer contaminant

APPLIED PHYSICS LETTERS

ARTER WE, D ARSIE L, WU XY, ESCONJAUREGUI S, ROBERTSON J

Metal-catalyst-free growth of graphene on insulating substrates by ammonia-assisted microwave plasma-enhanced chemical vapor deposition

RSC ADVANCES

ZHENG S, ZHONG GF, WU XY, D ARSIE L, ROBERTSON J

Growth of continuous graphene by open roll-to-roll chemical vapor deposition

APPLIED PHYSICS LETTERS

ZHONG GF, WU XY, D ARSIE L, TEO KBK, RUPESINGHE NL, JOUVRAY A, ROBERTSON J

Growth of Continuous Monolayer Graphene with Millimeter-sized Domains Using Industrially Safe Conditions

SCIENTIFIC REPORTS

WU XY, ZHONG GF, D ARSIE L, SUGIME H, ESCONJAUREGUI S, ROBERTSON AW, ROBERTSON J

Stable, efficient p-type doping of graphene by nitric acid

RSC ADVANCES

D ARSIE L, ESCONJAUREGUI S, WEATHERUP RS, WU XY, ARTER WE, SUGIME H, CEPEK C, ROBERTSON J

Long-Term Passivation of Strongly Interacting Metals with Single-Layer Graphene

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

WEATHERUP RS, D ARSIE L, CABREROVILATELA A, CANEVA S, BLUME R, ROBERTSON J, SCHLOEGL R, HOFMANN S