国家/地区 Korea（3）
关键词 ATOMIC LAYER DEPOSITION（3）
出版物
出版时间 2015（3）
机构
作者

Defect-curing function of self-limiting Al2O3 thin films in graphene materials

CERAMICS INTERNATIONAL

KWON KW, CHOI JW, JUNG MW, YOU YH, CHANG R, SEO JH, SONG W, AN KS, HWANG JH

Hexagonal boron nitride assisted growth of stoichiometric Al2O3 dielectric on graphene for triboelectric nanogenerators

NANO ENERGY

HAN SA, LEE KH, KIM TH, SEUNG W, LEE SK, CHOI S, KUMAR B, BHATIA R, SHIN HJ, LEE WJ, KIM S, KIM HS, CHOI JY, KIM SW

Improvement of Gate Dielectric Integrity Using O-2 Plasma Treatment Prior to Atomic Layer Deposition on Chemical Vapor Deposition Grown Graphene

JOURNAL OF NANOSCIENCE NANOTECHNOLOGY

SUL O, BONG J, YOON A, CHO BJ