国家/地区 Usa(26)
关键词 GRAPHENE(11) MOBILITY(5) ATOMIC LAYER DEPOSI.(4)
CHEMICAL VAPOR DEPO.(3) ALUMINA(2) CONTACT RESISTANCE(2)
ELECTRON MOBILITY(2) FIELD EFFECT TRANSI.(2) HIGHK DIELECTRIC TH.(2)
INSULATED GATE FIEL.(2) NUCLEATION(2) PERMITTIVITY(2)
RAMAN SPECTROSCOPY(2) TRANSISTOR(2) XRAY PHOTOELECTRON .(2)
出版物 APPLIED PHYSICS LET.(7) ACS NANO(3) JOURNAL OF PHYSICAL.(3)
NANO LETTERS(3) IEEE ELECTRON DEVIC.(2) SCIENCE(2)
出版时间 2012(6) 2009(4) 2010(4) 2011(4) 2013(3) 2014(3)
机构 UNIV TEXAS D.(13) TEXAS INSTRU.(7) UNIV TEXAS A.(5)
作者 COLOMBO L(26)

APPLIED SURFACE SCIENCE

MCDONNELL S, AZCATL A, MORDI G, FLORESCA C, PIRKLE A, COLOMBO L, KIM J, KIM M, WALLACE RM

JOURNAL OF PHYSICAL CHEMISTRY C

ZHANG HJ, LEE G, GONG C, COLOMBO L, CHO K

IEEE ELECTRON DEVICE LETTERS

PARK S, LEE S, MORDI G, JANDHYALA S, HA MW, LEE JS, COLOMBO L, WALLACE RM, LEE BH, KIM J

SCIENCE

HAO YF, BHARATHI MS, WANG L, LIU YY, CHEN H, NIE S, WANG XH, CHOU H, TAN C, FALLAHAZAD B, RAMANARAYAN H, MAGNUSON CW, TUTUC E, YAKOBSON BI, MCCARTY KF, ZHANG YW, KIM P, HONE J, COLOMBO L, RUOFF RS

JOURNAL OF PHYSICAL CHEMISTRY C

GONG C, FLORESCA HC, HINOJOS D, MCDONNELL S, QIN XY, HAO YF, JANDHYALA S, MORDI G, KIM J, COLOMBO L, RUOFF RS, KIM MJ, CHO K, WALLACE RM, CHABAL YJ

PROCEEDINGS OF THE IEEE

COLOMBO L, WALLACE RM, RUOFF RS

JOURNAL OF PHYSICAL CHEMISTRY C

GONG C, COLOMBO L, CHO K

SOLID STATE COMMUNICATIONS

VENUGOPAL A, COLOMBO L, VOGEL EM

APPLIED PHYSICS LETTERS

MORDI G, JANDHYALA S, FLORESCA C, MCDONNELL S, KIM MJ, WALLACE RM, COLOMBO L, KIM J

ACS NANO

CHAN J, VENUGOPAL A, PIRKLE A, MCDONNELL S, HINOJOS D, MAGNUSON CW, RUOFF RS, COLOMBO L, WALLACE RM, VOGEL EM