国家/地区 Usa（20）
关键词 GRAPHENE（8） ATOMIC LAYER DEPOSI.（2） NANOPORE（2）
SINGLE MOLECULE DET.（2）
出版物 APPLIED PHYSICS LET.（3） CARBON（2）
出版时间 2012（3） 2016（3） 2017（3） 2009（2） 2013（2） 2015（2） 2020（2）
机构 UNIV TEXAS D.（7） SOUTHERN MET.（2） UNIV MINNESO.（2） UNIV TEXAS A.（2）
作者 KIM MJ（20）

Selective-Area Remote Epitaxy of ZnO Microrods Using Multilayer-Monolayer-Patterned Graphene for Transferable and Flexible Device Fabrications

ACS APPLIED NANO MATERIALS

JEONG J, JIN DK, CHA J, KANG BK, WANG QX, CHOI J, LEE SW, MIKHAILOVSKII VY, NEPLOKH V, AMADORMENDEZ N, TCHERNYCHEVA M, YANG WS, YOO J, KIM MJ, HONG S, HONG YJ

Imprinting Graphene on Polymer Substrates via Coextrusion

INDUSTRIAL ENGINEERING CHEMISTRY RESEARCH

MUN SC, KIM SI, KIM MJ, MACOSKO CW

Strategies for interfacial localization of graphene/polyethylene-based cocontinuous blends for electrical percolation

AICHE JOURNAL

MUN SC, KIM MJ, COBOS M, GU LL, MACOSKO CW

Rapid Selective Etching of PMMA Residues from Transferred Graphene by Carbon Dioxide

JOURNAL OF PHYSICAL CHEMISTRY C

GONG C, FLORESCA HC, HINOJOS D, MCDONNELL S, QIN XY, HAO YF, JANDHYALA S, MORDI G, KIM J, COLOMBO L, RUOFF RS, KIM MJ, CHO K, WALLACE RM, CHABAL YJ

Facile, scalable synthesis of edge-halogenated graphene nanoplatelets as efficient metal-free eletrocatalysts for oxygen reduction reaction

SCIENTIFIC REPORTS

JEON IY, CHOI HJ, CHOI M, SEO JM, JUNG SM, KIM MJ, ZHANG S, ZHANG LP, XIA ZH, DAI LM, PARK N, BAEK JB

In situ studies on the shrinkage and expansion of graphene nanopores under electron beam irradiation at temperatures in the range of 400-1200 degrees C

CARBON

LU N, WANG JG, FLORESCA HC, KIM MJ

Low-kappa organic layer as a top gate dielectric for graphene field effect transistors

APPLIED PHYSICS LETTERS

MORDI G, JANDHYALA S, FLORESCA C, MCDONNELL S, KIM MJ, WALLACE RM, COLOMBO L, KIM J

Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone

ACS NANO

JANDHYALA S, MORDI G, LEE B, LEE G, FLORESCA C, CHA PR, AHN J, WALLACE RM, CHABAL YJ, KIM MJ, COLOMBO L, CHO K, KIM J

Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices

APPLIED PHYSICS LETTERS

LEE B, MORDI G, KIM MJ, CHABAL YJ, VOGEL EM, WALLACE RM, CHO KJ, COLOMBO L, KIM J

Synthesis of Isotopically-Labeled Graphite Films by Cold-Wall Chemical Vapor Deposition and Electronic Properties of Graphene Obtained from Such Films

NANO RESEARCH

CAI WW, PINER RD, ZHU YW, LI XS, TAN ZB, FLORESCA HC, YANG CL, LU L, KIM MJ, RUOFF RS