国家/地区 | |
关键词 | CHEMICAL VAPOUR DEPOSITION(4) |
出版物 | APPLIED PHYSICS LETTERS(4) |
出版时间 | 2011(4) |
机构 | |
作者 |
APPLIED PHYSICS LETTERS
FU XW, LIAO ZM, ZHOU JX, ZHOU YB, WU HC, ZHANG R, JING GY, XU J, WU XS, GUO WL, YU DP
APPLIED PHYSICS LETTERS
OKANO M, MATSUNAGA R, MATSUDA K, MASUBUCHI S, MACHIDA T, KANEMITSU Y
APPLIED PHYSICS LETTERS
KIM BJ, LEE C, JUNG Y, BAIK KH, MASTRO MA, HITE JK, EDDY CR, KIM J
APPLIED PHYSICS LETTERS
SUN J, LINDVALL N, COLE MT, TEO KBK, YURGENS A