国家/地区 中国（2）
IPC部 C（2）
IPC大类 C23（2） C25（2）
IPC小类 C23C（2）
IPC C23C016/02（2）
发明人
公开年
申请年 2015（2）
专利权人

Prevention of deposition of reactants and by-products in metal-organic chemical vapor deposition reaction chamber by electrochemically polishing component part, depositing catalytic reaction layer, protecting and depositing graphene layer.

FANG C, JIN K, LIU X, WANG L, YANG C, ZHANG L, ZHANG Y

Preparing graphene catalyst based copper nano wires used for manufacturing semiconductor devices, involves carrying out flattening process of high-purity aluminum sheet and oxidizing aluminum sheet.

HAO Y, LU X, WANG D, ZHANG J