国家/地区 印度（2）
IPC部 C（2）
IPC大类 C23（2）
IPC小类 C23C（2）
IPC
发明人
公开年 2023（2）
申请年 2021（2）
专利权人

Depositing gate dielectric on two-dimensional material involves depositing seed layer over atomically smooth surface of two dimensional material, evaporating predefined thickness of seed layer from atomically smooth surface, and performing atomic layer deposition.

SHRIVASTAVA M, KHANEJA M, MEERSHA A

System for preparing core-shell polymer yarn, has inner core containing polymer monofilament(s) or polymer multifilament, and outer shell containing mixture of at least one polymer with specified softening point, biocide and/or additive containing metallic, ceramic, inorganic or organic group.

MAHAJAN C, GUNARI N, GARWARE V R