国家/地区 日本（2）
IPC部 C（2）
IPC大类 C01（2） C30（2） H01（2）
H05（2）
IPC小类 C01B（2）
IPC
发明人
公开年 2022（2）
申请年 2022（2）
专利权人 TOKYO ELECTR.（2）

Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.

TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI

Film formation method involves forming metal film on silicon-containing film of substrate, forming a graphene film on metal film, where metal film is silicided by heating metal film, and continuously performing film forming process.

UEDA H, WADA M, ZHEN