国家/地区 德国（2）
IPC部 C（2）
IPC大类 C23（2）
IPC小类 C23C（2）
IPC C23C016/44（2）
发明人 CONRAN B R（2） MCALEESE C（2） TEO K B K（2）
公开年 2022（2）
申请年 2020（2） 
专利权人 AIXTRON SE（2）

Deposition of two-dimensional layers on substrate in process chamber, involves heating substrate, feeding reactive gas of carbon-containing chalcogenide, and adjusting substrate temperature, process chamber pressure, and partial pressure of reactive gas so that graphene is deposited as layer.

MCALEESE C, CONRAN B R, TEO K B K

Deposition of two-dimensional layer on substrate in process chamber of chemical vapor deposition reactor, involves feeding one or more reactive gases into a process chamber and depositing spaced apart crystalline regions on surface of substrate under specific process parameters.

MCALEESE C, CONRAN B R, TEO K B K