国家/地区 中国（2）
IPC部
IPC大类
IPC小类
IPC
发明人 GUAN Y（2） LI N（2） QU F（2）
XIA Y（2） XIE J（2） ZHAO L（2）
公开年 2019（2）
申请年
专利权人 INST MICROELECTRONICS CHINESE ACAD SCI（2）

Selective graphene etching involves setting wavelength, power, and scanning path of laser, focusing through lens array, scanning area of substrate surface, completely etching away thin layer of graphene in area, and forming pattern.

GUAN Y, XIE J, QU F, LI N, ZHAO L, XIA Y

Processing graphene thin film material useful in field-effect transistor, optoelectronics and microprocessor field, comprises e.g. adjusting carrier sample stage to processing positioning point and performing selective scanning modification.

XIE J, QU F, XIA Y, LI N, ZHAO L, GUAN Y