国家/地区 中国（2）
IPC部 C（2）
IPC大类
IPC小类
IPC
发明人 WANG H（2） XIAO X（2）
公开年 2022（2）
申请年
专利权人 JIANGSU YUNYONG ELECTRONICS TECHNOLOGY（2）

Preparing quantum resistance chip based on graphene, involves providing silicon carbide substrate, annealing silicon carbide substrate, performing epitaxial growth on surface of substrate by using chemical vapor deposition method by using silicon ethane as gas catalyst and acetylene.

XIAO X, CHEN L, KONG Z, WANG H

Preparation of hexagonal boron nitride surface torsion double-graphite alkene involves introducing reaction gas and catalytic gas into chemical vapor growth chamber at second preset temperature.

WANG W, XIAO X, JIANG C, WANG H