国家/地区 日本（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/194（2）
发明人
公开年 2022（2）
申请年
专利权人 NAT INST ADVANCED IND SCI TECHNOLOGY（2）

Processing of carbon nanomaterial-containing film in manufacture of electronic device, involves forming resist mask and/or metal mask on film, irradiating film with light in presence of etchant, and removing resist mask and/or metal mask.

ZHANG M F, YANG M, OKAZAKI T, HIDEAKI N, OKIGAWA Y, YAMADA T

Ceramic capacitor used in electronic device, comprises dielectric nanocrystal array layer, lower electrode and upper electrode arranged opposite to each other and inorganic two-dimensional material layer.

ITASAKA H, MIMURA K, LIU Z, KATO K