国家/地区 韩国（2）
IPC部
IPC大类
IPC小类
IPC
发明人 BAE M H（2）
公开年
申请年 2013（2）
专利权人 KOREA RES IN.（2）

Apparatus useful for etching graphene comprises a vacuum chamber, a reaction gas inlet port to pass reaction gas inside of vacuum chamber, stage provided with graphene pattern layer, and a sensor to sense graphene pattern layer temperature.

BAE M H, LEE T H, KIM N, HA D H

Electric current device for pumping electron from graphene, comprises graphene layer that is formed on insulation layer, where electron is pumped to graphene layer using microwave applied to gate electrodes formed on insulation layer.

BAE M H, KIM N