国家/地区 中国（2）
IPC部
IPC大类
IPC小类
IPC
发明人 KE L（2）
公开年 2021（2）
申请年 2021（2） 
专利权人

Plasma etching anode plate used in semiconductor processing manufacturing process, has anode plate main portion provided multiple mounting positions, where through hole is individual detachably mounted on mounting position.

WANG Z, WU L, KE L

Preparing carbon material-aluminum-based composite material, involves mixing carbon material and aluminum-based material, preheating, subjecting to friction extrusion and rapidly cooling during extrusion process.

XIA C, CAO J, HUANG C, LIU Q, KE L