国家/地区 中国（2）
IPC部 C（2）
IPC大类
IPC小类
IPC
发明人 LI K（2）
公开年 2012（2）
申请年
专利权人

Polyvinyl chloride/graphene antistatic composite material contains specified amount of impact modifier, expanded graphite as conductive filler, processing auxiliary agent and matrix resin.

CHEN C, KANG J, LI J, LI K, LI S, LIANG Y, NIU H, YAN L, WANG X, ZHU X, ZHANG S

Growing graphene on silicon carbide substrate epitaxially involves adopting formation technology imaging substrate, on surface of substrate, forming graphic array, performing thermal decomposition to patterned substrate and forming graphene.

CHEN X, GUO L, JIA Y, LI K, LIN J, WANG G, WANG W