国家/地区 中国（5）
IPC部 C（5）
IPC大类 C01（5）
IPC小类 C01B（5）
IPC C01B032/194（5）
发明人 XU C（5）
公开年 2021（5）
申请年 2020（2）  2021（2） 
专利权人

Use of reduced metal oxide semiconductor nanomaterial in antibacterial material for killing pathogenic microorganisms such as prion, virus, mycoplasma, Chlamydia, Rickettsia, bacteria, fungi, Spirochetes and/or protozoa in e.g. antibacterial dressing, and antibacterial consumable.

CHEN T, MA X, XU C, WU A, REN W

Preparing mesoporous tin oxide nanorod/nitrogen doped graphene sensitive material useful for absorbing formaldehyde comprises mixing tin salt solution and graphene oxide, adding nitrogen doping agent, freezing, drying and cooling.

LU J, CAO Q, WANG Y, XU C, LI C

Patterned growth of vertically oriented graphene useful e.g. in energy storage, involves prefabricating required pattern on target substrate by ultraviolet lithography, and growing graphene by plasma enhanced chemical vapor system.

XU C, QIAN F, DENG J, XIE Y, WANG Q, HU L

Preparation of modified graphene, involves adding graphene and sulfur-nitrogen compound to water, adding obtained mixture to reaction furnace, heating, stirring, cooling, solid-liquid separating, and storing solid portion as product.

XU C, LIN P

New photoactive modified graphene i.e. 10,15-bis(2-oxoethoxy)tetrabenzo(bc,ef,kl,no)coronene-1,2,5,7,13-pentacarbaldehyde compound useful in preparing photopolymerizable composite material.

XU C