国家/地区 中国（2）
IPC部
IPC大类
IPC小类
IPC
发明人 ZHOU M（2）
公开年 2018（2）
申请年 2016（2）
专利权人

Method for fabricating graphene device, involves forming dielectric layer on graphene layer, etching dielectric layer to partially expose graphene layer, and forming ruthenium oxide layer on exposed graphene layer.

ZHOU M

Preparation of modified graphene oxide-coated silica gel useful as chromatographic filler, involves mixing silica gel with toluene, adding (aminopropyl)triethoxysilane, aqueous graphene oxide solution and ionic liquid and reacting.

CAO X, MA B, ZHOU M, GUO L, ZHU Y, WANG H, LI X, WANG Q, ZHANG S, TANG Z, ZHANG W, ZHANG L, DING Y