国家/地区 美国（4） 世界知识产权组织（3）
IPC部 B（4）
IPC大类 C01（4） B32（3） H01（3）
B05（2） B82（2）
IPC小类 C01B（4） B32B（3） B05D（2）
B82Y（2） H01L（2）
IPC C01B032/194（4）
发明人 YAGER T A（2）
公开年
申请年
专利权人 EMPIRE TECHNOLOGY DEV LLC（4）

System used to at least partially alter defect area in layer of graphene, on substrate, comprises chamber to receive layer including some graphene and defect areas in graphene, and container to e.g. react substrate to produce cationic area.

MILLER S A, YAGER T A

Etching method of graphene, involves etching exposed portions of graphene to form etched graphene structure, after applying resist to surface of graphene opposite to patterned substrate.

ANDERSON K, SJONG A

Composition used for removing components from fluids e.g. sewage water and waste water, and for forming capacitor, comprises structure having graphene sheets and carbon nanotubes disposed between graphene sheets.

WEI L, ZHANG Y

Method for transferring layer of graphene from transitional metal substrate onto target substrate, involves conforming layer of graphene to target substrate to form graphene on substrate assembly by applying hydrostatic pressure.

YAGER T A