国家/地区 美国（2）
IPC部 B（2）
IPC大类 B05（2） B32（2） C01（2）
IPC小类 B05C（2）
IPC B05C003/20（2）
发明人 MILLER S A（2） YAGER T A（2）
公开年
申请年
专利权人 EMPIRE TECHNOLOGY DEV LLC（2）

System used to at least partially alter defect area in layer of graphene, on substrate, comprises chamber to receive layer including some graphene and defect areas in graphene, and container to e.g. react substrate to produce cationic area.

MILLER S A, YAGER T A

Partially altering defect area in a layer on substrate involves reacting substrate under reaction conditions to produce cationic area in exposed areas; adhering graphene oxide to cationic area to produce graphene oxide layer; and reducing.

MILLER S, YAGER T, MILLER S A, YAGER T A