国家/地区 美国（5）
IPC部 C（5）
IPC大类 C01（5） B32（2） B82（2）
IPC小类 C01B（5）
IPC C01B031/04（5） B32B037/24（2） B32B038/00（2）
B82Y030/00（2） B82Y040/00（2） C01B031/00（2）
发明人 JANG B Z（5） ZHAMU A（5） FU L（2）
WANG Y（2）
公开年 2015（5）
申请年 2014（5）
专利权人 NANOTEK INSTR INC（5）

Production of highly oriented graphitic film for microelectronic device involves dispensing and depositing graphene oxide or chemically functionalized graphene dispersion on supporting substrate and thermally reducing after removing medium.

ZHAMU A, JANG B Z

Producing graphitic film used in electronic device, comprises mixing graphene platelets with carbon precursor polymer and liquid, removing liquid from wet film, carbonizing precursor polymer composite film and thermally treating the film.

ZHAMU A, JANG B Z

Production of graphene material involves dispersing starting graphitic material in liquid medium to form graphite suspension and introducing graphite suspension into hydrodynamic cavitation reactor that exfoliates graphene planes.

BURTON D J, JANG B Z, ZHAMU A

Method for producing bulk highly oriented graphene structure that is utilized in thermal management device e.g. heat dissipation plate, involves preparing graphene oxide dispersion, and dispensing and depositing graphene oxide dispersion.

ZHAMU A, JANG B Z, WANG Y, FU L

Producing highly oriented graphene film used in thermal management device, comprises dispensing and depositing graphene oxide dispersion or gel onto substrate, removing fluid medium, stacking first and second dried layers and heat treating.

ZHAMU A, JANG B Z, WANG Y, FU L