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C23(2)
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C23C016/56(2)
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Preparing two-dimensional compound semiconductor thin film useful in micro-nano electronic device, comprises placing insulating substrate with single-layer two-dimensional layered material/metal oxide film vertical heterostructure on surface in heating device, and introducing carrier gas.
SHI Z, ZHANG C, ZHU H, WU T, GAO B
Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.
CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H
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