国家/地区 中国（7）
IPC部 C（7）
IPC大类 C08（7）
IPC小类 C08F（7） C04B（4） C01B（3）
B01F（2）
IPC C08F283/06（7）
发明人 MA H（4） ZHU A（4） HUANG J（2）
JIAN S（2） LI X（2） MA B（2）
TAN H（2） ZHU Y（2）
公开年 2016（7）
申请年 2016（4）  2015（3） 
专利权人 ANHUI XINRUN.（4） UNIV WUHAN T.（2）

Improved concrete strength modified polycarboxylic acid water reducer includes isopentenyl ether, acrylic acid, ammonium persulfate, mercaptoacetic acid, lignin, sodium hydroxide solution, deionized water, graphene oxide and nano alumina.

ZHU A, MA H

Graphene oxide composite lignin modified polycarboxylic acid high efficiency water reducing agent includes isopentenyl ether, acrylic acid, ammonium persulfate, mercaptoacetic acid, lignin, sodium hydroxide solution and sodium nitrite.

ZHU A, MA H

Added rare earth tailing polycarboxylic acid high efficiency water reducing agent includes isopentenyl ether, acrylic acid, ammonium persulfate, mercaptoacetic acid, lignin, sodium hydroxide solution, deionized water and graphene oxide.

ZHU A, MA H

Water reducing agent comprise isopentyl ether, acrylic acid, ammonium persulfate, mercaptoacetic acid, lignin, sodium hydroxide solution, graphene oxide, dodecyl alcohol ester, redispersible glue powder, and sodium hydroxide.

ZHU A, MA H

Block copolymer used for manufacturing graphene for forming sheet used for electrical component and structural component, comprises substituted hydrocarbon repeating unit and ethylene repeating unit.

LEE M J, SOHN B, CHAE S Y, KWON W J, SOHN K N, SOHN B H, CHAE S, LI M, KWON W, SOHN K

Preparation of surfactant used for controlling compatibility of controllable graphene by reacting subjecting styrene monomer to free-radical copolymerization with methacrylate and polyether macromer initiator, precipitating, and drying.

HUANG J, JIAN S, LI X, MA B, TAN H, ZHU Y

Preparation of surface active agent for compatibility controlled oxidation of graphene peeling, involves carrying out copolymerization of styrene monomer, methacrylate and polyether macromonomer by free radical copolymerization.

HUANG J, JIAN S, LI X, MA B, TAN H, ZHU Y