国家/地区 中国（8）
IPC部 C（8）
IPC大类 C04（8） C08（8）
IPC小类 C04B（8）
IPC C08F220/06（8）
发明人
公开年 2021（6） 2020（2）
申请年 2020（8）
专利权人

Carboxylated styrene-butadiene latex used in cement-based artificial granite plate, comprises sodium lignin sulfonate, dilauryl ether disulfonic acid, tripotassium phosphate, potassium persulfate, water, styrene, and dodecyl mercaptan.

LIU J

Preparation of graphene oxide modified isopentenyl polyethylene glycol-based polycarboxylate superplasticizer involves polymerizing isopentenyl polyethylene glycol, graphene oxide, sodium p-styrene sulfonate and acrylic acid.

BAO N, LIU Y, LI D, LI Q, ZHOU J, FU X

Graphene suspension cement-based material, comprises polycarboxylic acid water reducing agent, graphene, graphene oxide and water.

WANG Q, ZHAN D

High-absorption dispersion type polycarboxylic acid water reducing agent comprises modified polyether macromonomers, esterified monomers, alkoxysilane monomers, unsaturated acids, initiators, chain transfer agents and neutralizers.

ZHU S, LIN Y, LAI H, FANG Y, LI G, CHEN Z, SHAO Y

Conductive polymer composite material comprises cement, medium sand, conductive filler, polymer, silica fume, expansion agent, dispersant, defoamer water reducing agent, and water.

WANG L, TIAN Y, GAO P, LI X, SHAN H, XU S, SUN X, WANG R, ZHANG J

Polymer cement waterproof coating comprises liquid material and powder material, liquid material comprises modified styrene-acrylic emulsion, antibacterial agent, thickener and film forming agent and the powder comprises portland cement.

HONG L

Low air entraining retarding type polycarboxylic acid water reducing agent comprises e.g. macromonomer, acrylic acid, sodium methallyl sulfonate, 2-hydroxyethyl methacrylate phosphate, silane-modified graphene, and ammonium persulfate.

SUN H

Preparing modified polyether useful in polycarboxylic acid water reducing agent, comprises e.g. dissolving graphene in organic solvent to perform addition reaction, substituting, and carrying out alcohol dehydration reaction.

WANG X, WU Z, LIU W, GUO C, ZHANG X, LI J