国家/地区 台湾（3）
IPC部 C（3）
IPC大类 C23（3）
IPC小类 C23C（3） C01B（2） H01L（2）
IPC C23C016/26（2）
发明人 LIN C（3）
公开年
申请年
专利权人

Forming graphene on flexible substrate, involves providing polymer substrate including metal structure, carbon source and carrier gas, and subjecting polymer substrate to plasma enhanced chemical vapor deposition process.

TSENG C, LIN C, YEH N, LEU C, LU C

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Capacitor cathode foil structure manufacturing method, involves entering carbon precursor into reaction chamber, depositing graphene layer on surface of base foil, and forming graphene layer by graphene thin film.

CHEN M, LIN Q, WANG Y, LIN C, LIN C F, CHEN M T, WANG Y Y