国家/地区 韩国（3） 美国（3）
IPC部 C（4） H（3） B（2）
IPC大类 C01（4）
IPC小类 C01B（4）
IPC C01B031/04（4）
发明人 KIM J K（2） LEE S H（2）
公开年
申请年 2016（2） 
专利权人 KOREA INST SCI TECHNOLOGY（4）

Manufacture of sulfur-doped reduced graphene oxide used for manufacturing sheet, involves adding graphite powder to acidic solution, dispersing, mixing resultant graphene oxide and sulfur compound, heat-treating and cooling obtained product.

KIM Y H, YANG S J, KIM C K, KOO C M, HONG S M, HWANG S S, BAEK K Y, SHAHZAD F, CHO S K

Polymer nanomesh used for preparation of graphene nanomesh, has planar structure having cyclized nanomesh-forming polymer and two-dimensional holes arranged on planar structure.

JOH H, SON S Y, LEE S H, KIM T

Manufacture of reduced graphene oxide for manufacturing reduced graphene-polymer composite, involves treating graphite with strong acid, mixing with halogen-substituted aromatic compound and stirring.

KU B C, PARK O K, LEE S H, NA S I, JO H I, KIM J K, LEE J H, KU B, PARK O

Electroconductive particle comprising a polymer microparticle and graphene coating layer grafted on the polymer microparticle, useful in anisotropic conductive film for packaging electronic devices.

LEE S, KIM K, LIM S H, PARK M, KIM J K, KIM H, LEE H, KIM G, IM S, KIM J, KIM K H, KIM H S, YI S S, I H J, SU LEE S, SUK KIM H, JEONG LEE H, GYEONG KIM J, HO IM S, LEE S S