国家/地区 美国（2）
IPC部 C（2）
IPC大类 C08（2）
IPC小类 C08G（2）
IPC G03F007/11（2）
发明人
公开年
申请年
专利权人

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Method for preparing graphene/poly(3,4-ethylenedioxythiophene) polystyrene sulfonate mixed solution, involves mixing graphene powder and aqueous surfactant followed by dispersing diluted solution to obtain mixed solution.

HU T, LI Y, LEE Y