国家/地区 中国（7） 世界知识产权组织（2）
IPC部 C（8）
IPC大类 C09（8）
IPC小类 C09D（8）
IPC C09D007/12（6） C09D005/08（4） C09D005/10（2）
C09D163/00（2） C09D175/02（2） C09D175/04（2）
发明人 WANG J（8）
公开年 2017（6） 2016（2）
申请年 2016（8）
专利权人 ZTE CORP（2）

Graphene heavy-duty hard repair coating comprises component containing polyaspartate resin, N-carboxymethyl-N-methylpyrrolidine bis(trifluoromethyl sulfonyl)imine salt and graphene powder, and hexamethylene diisocyanate trimer.

LAI X, SHAO C, SUN Z, TAN H, WANG J, ZHANG H, ZHANG X, ZHENG H

Preparation of graphene graft-modified epoxy acrylate for photocurable coating, involves preparing acylated graphene, adding reactive group-containing acrylate, acid-binding agent and epoxy resin and copolymerizing.

LI S, HUANG K, WU F, WANG J, SHI M

Graphene functional metal surface long-term treatment material contains graphene, polymer resin, mixed solvent, pigment, additive and rust-proofing agent, isophorone diamine and modified low molecular weight bisphenol F type epoxy resin.

DAI P, WANG J, LIU H

Graphene-based thermally conductive anti-corrosion coating comprises graphene, epoxy resin, base filler, coupling agent, defoamer, dispersant and solvent.

LI H, LI X, MIAO W, TENG J, WANG G, WANG J, WU L, ZHAO Y, ZHENG Y

Anti-corrosion nano-coating used for enhancing cathodic protection function of metal surfaces, comprises titanium, zinc, graphene and epoxy resin.

WANG J, WU X

Graphene heavy duty and hard repair coating comprises component comprising polyaspartic acid ester resin, N-carboxymethyl-N-methylpyrrole and graphene powder, and component comprising hexamethylene diisocyanate trimer curing agent.

LAI X, SHAO C, SUN Z, TAN H, WANG J, ZHANG H, ZHANG X, ZHENG H

Printing ink used for forming pattern, comprises polysiloxane, binder, printing color ink, ink reinforcing agent, oxidized polyethylene wax, organic solvent, anti-settling agent, dispersant and graphene.

WANG J, ZHONG Z

Oxidized graphene ink used in ink jet printer comprises graphene oxide, surfactant and solvent.

KANG Y, LI Y, WANG J, WANG F, YAO C, YIN Z, LI P, WANG B, CAI F, TAO C, YIN C