国家/地区 韩国（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/194（2）
发明人 KIM K S（2）
公开年 2022（2）
申请年
专利权人

Manufacturing graphene thin film for pellicle material using ozone gas useful in semiconductor devices comprises forming graphene on the upper surface of substrate, exposing graphene layer to ozone, and heat-treating and etching.

LEE G H, KWON Y, WOOK Y B, MOON S I, MOON J, KIM K S, LEE S M

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W