国家/地区 中国（2）
IPC部 B（2）
IPC大类 B01（2） C01（2）
IPC小类 B01J（2）
IPC C01B031/04（2）
发明人 ZHU J（2）
公开年
申请年 2014（2）
专利权人

Method for modifying e.g. I-V characteristics, of graphene i.e. semiconductor film, involves placing graphene film in vacuum environment, and radiating graphene film with electron beam to obtain graphene material.

HUANG C, CHU C, CHIU S, WANG C, WEI C, CHUNG C, WU B, HUANG J, QIU S, WANG J, ZHU J, WEI J, ZHONG C, HUANG C H, CHU C W, CHIU S M, WANG C C, WEI C M, CHUNG C J, WU B H

Preparation of porous graphene involves processing biomass-based carbon source with catalyst, obtaining intermediate product and heat-preserving intermediate at predetermined conditions.

ZHU J, LIU Z, ZHOU G, LIU D, LIU X, TANG Y, WANG E, ZHANG J, ZHENG Y