国家/地区 韩国（3）
IPC部 B（3） C（2）
IPC大类 B01（3） C01（2）
IPC小类 B01J（3）
IPC B01J019/12（2） C01B031/02（2）
发明人 KIM H（3）
公开年
申请年 2012（2） 
专利权人 KOREA INST SCI TECHNOLOGY（3）

Preparing metal single-atom catalyst involves depositing metal single atoms to nitrogen precursor powder and mixing the metal single atom-deposited nitrogen precursor powder with carbonaceous support and carrying out heat treatment.

KIM H, JANG J H, KIM J Y, PARK H S, LEE S Y, PARK H, JANG I, YOO S J, YOUNG P H, KIM J, CHANG J H, KIM H J

Manufacture of doped graphene for manufacturing semiconductor, involves mixing graphite powder and acid solution, oxidizing, drying, impregnating graphite oxide solid to organic compound aqueous solution, microwave heating and reducing.

LEE S S, KIM H, PARK M, LIM S H, GON S J, KWANG H L, KIM T A

Manufacturing boron-doped reduced graphene, useful as semiconductor with p-type characteristics, comprises adding boron oxide to graphene oxide, removing solvent from resulting solution to obtain solid mixture, and heating the solid mixture.

KIM H, DA YOUNG Y, PARK M, LIM S H, GON S J, LEE S S